DIRECT LASER AND ULTRAVIOLET LITHOGRAPHY OF POROUS SILICON PHOTONIC CRYSTAL DEVICES

A simple method to locally change the optical properties of porous silicon multilayers and photonic crystal architectures. This technique allows for the direct photolithography of porous silicon multilayers, heterostructures, and photonic crystals.

TTO is selling a technology based on Adaptive Optics, Glass & other optical materials, Optical Components & Devices This technology for sale called “Direct laser and ultraviolet lithography of porous silicon photonic crystal devices” is meant for the following industries: Photonics & Optics, Optoelectronics, Laser & Light Sources, Telecommunications .

Looking for a partner to establish any kind of relationship that will accelerate the path of the technology to the end-user market.

A partner in form of Joint research. This is an agreement on cooperation between the parties on research and development on an equal level (Synergy and international partnership, EU H2020 funding application).

Looking for an Exchange transaction in order to transfer the technology.

This Exchange can be done through a licensing agreement as a partnership to authorize to use the license of the technology in exchange for an agreed payment (fee or royalty).

The Technology Readiness Level reached is level 4 (Component and/or breadboard validation in laboratory environment), this means that basic technological components have been integrated to establish that they work together. However this is relatively “low fidelity” compared with the eventual system.